Effect of Medium Pressure Ultraviolet/Chlorine Advanced Oxidation on the Production of Disinfection by-Products from Seven Model Benzene Precursors

UV/chlorine advanced oxidation process (AOP), as a potential alternative to UV/H2O2 in water treatment, may pose risk of increased disinfection by-product (DBP) formation and is great concern. In this paper, seven benzene derivatives, containing two chlorine-inert five chlorine-active compounds, were selected typical model DBP precursors, the effects medium pressure (MPUV/chlorine) on their chlorine demand (DBPFP) evaluated. The results showed that MPUV/chlorine could significantly increase DBPFP inert precursors. For four slow but active accelerate short-term formation, whereas it an insignificant effect or even reduced DBPFP. only fast precursor, its overall was more significant at pH 6 than 8. presence Br−, bromine substitution factors THMs. addition, linear fitting indicated UV/chlorine-induced change be considered indicator for prediction alteration.